Freeze Dryer @ – 55 °C, including vacuum pump (≤ 10 Pa). Equipment useful for sample preservation via pre-freezeing and water sublimation under vacuum. Water capture capability: 3 kg / 24 hours Drying cabinet with sample disposal in 4 trays (200 x 20 mm) or in 8 bottles. Drying time: 24 h Electronic control of temperature, with USB disk interface for data storage.

Research microscope for examination of specimens by transmitted light brightfield, phase contrast and bright field incident light and dark fluorescence, Axio Imager M2M combines high quality optics and bright fluorescence to provide clearer images. Contrast control and light provides certainty using the microscope in different ways and obtaining reproducible results. It is designed as a platform dedicated to applications in cell biology, neuroscience, molecular genetics and pathology. The device is equipped with a motorized stand for sample, motorized epifluorescence objectives (5X – 100X) plus camera and software that allows the microscope to be optimally used for different applications with maximum efficiency and comfort.

Digital laboratory analytical balance with internal calibration, and 3 doors. Capacity: max. 210 g Rezolution: ± 0.1 mg.

Primo Star has been developed with long-term use and great durability in mind. It incorporates all of ZEISS’s experience in optical microscopy adapted to the most sophisticated environmental conditions in classroom settings and laboratory work. Together with its many practical accessories, Primo Star can be used for education, in the laboratory, doctors’ practice field. It offers the possibility to investigate the samples in transmitted light at a magnification between 4X and 100X. Optional, to the equipment it can be attached a digital video camera (Axiocam 105) which, by the microscope software allows real-time data acquisition. The obtained images could easily be converted from 2D format in 3D through ițs software for a better viewing.

Stainless steel equipment for cleaning via ultrasounds suitable for complex geometry, such as fins, undercuts, boreholes etc. Capacity: 4.2 liters Frequency: 45 kHz Temperature: ambiental+5 … 80 °C (accuracy 2°C) Time: 1 … 99min. (resolution 1 min.)

This equipment is a physical vapor deposition (PVD) method for creating thin films, using sputtering depositions. The device contain two sputtering sources or magnetrons, which can be loaded with the material of the desired coating composition; the sputtering is achieved with high voltage DC or RF argon plasma, but other gases can be used to create coatings via the reactive sputtering method. This equipment is configured for argon and nitrogen. Up to 6 materials sequentially or 2 materials simultaneously on substrates up to 250 mm dia may be submitted.

– precise and fast laboratory drying oven – chamber volume 111 litres – temperature range from 10°C above ambient to 250/300°C – forced air circulation system in the chamber guarantees homogeneous temperature distribution in all the processes of drying, heating and sterilization of materials in laboratories – high operation comfort, precise temperature control and short chamber temperature equalization times after the door opening – higher speed and accuracy of all the tempering procedures ensures economical operation, especially suitable for high humidity materials, for demanding and accurate tests and processes – wide selection of optional equipment and accessories – output for connecting a printer or PC – possibility of validation (IQ, OQ).

The RF Nano-PC installation has a unitary construction that ensure all equipment functions, in compliance with protection from corrosive gases, Faraday cage for industrial frequency generator, protective coating and gas filtration. The equipment is equipped with 2-channel gas: resistant to corrosive gas type CF4, SF6 (from stainless steel); channels controlled by MFC (Mass Flow Controllers) from the computer. The equipment can be used for etching with gases such as: O2, N2, Ar, CF4, SF6, air, or any combination of these gases. The basic control parameters are: base pressure; pumping time; flow through the MFC; radio frequency power generator; operating time; the time ventilation; temperature; alarm in case of opening the door during the process; display errors.

Temperature range: ambient temperature plus 5 °C to 300 °C, • Up to 30% lower energy consumption compared to conventional units on the market, • High-temperature accuracy thanks to APT.line™ technology, • Natural convection, • Controller with LCD display.

Heat treatment oven is an electric oven with rapid heating which is used both for the controlled heating and heat treatments at temperatures up to 1100 °C, as well as impurities diffusion in the material. Also, it can be used in the synthesis of metal materials or alloys. The oven includes a quartz tube with diameter of 125 mm and length of 1400 mm. At both ends of the quartz tube it has a pair of flanges for connection to the vacuum booster pump and the carrier gas / thermocouple. The temperature is controlled so as to have a very high stability on a broad landing and provide an increase or decrease in temperature with ± 1 ° C. The heating zone is 800 mm, heating rate 20 ° C / min and temperature control can be done either manually (by temperature programming with the regulator of the electronic box) and automatically using the computer provided.